发明名称 |
REACTION APPARATUS FOR PRODUCING SILICON |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing silicon having a silicon precipitation zone and a silicon dropping zone and suitable for recovery of fused silicon liquid as drops from the precipitation zone. SOLUTION: The manufacturing apparatus has the tip part of a dropping zone made of silicon nitride for dropping deposited silicon in a deposition zone, in order to recover fused silicon liquid as drops.
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申请公布号 |
JP2003002626(A) |
申请公布日期 |
2003.01.08 |
申请号 |
JP20010183015 |
申请日期 |
2001.06.18 |
申请人 |
TOKUYAMA CORP |
发明人 |
ODA KAIKO;NAKAMURA HIROHIKO |
分类号 |
C01B33/03;(IPC1-7):C01B33/03 |
主分类号 |
C01B33/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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