发明名称 METHOD FOR PULLING SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To produce an ingot of a defect-free silicon single crystal containing oxygen in an controlled concentration with comparative ease and with relatively low consumption of electric power and in a relatively narrow space. SOLUTION: A quartz crucible 14 is rotated at a predetermined speed and the ingot 16 of the silicon single crystal is rotated at a predetermined speed. A first coil 11 and a second coil 12 are arranged at a predetermined interval in the vertical direction so that the rotation axis of the crucible 14 agrees with the center of each coil, and electric currents are made to flow through the coils in such a manner that the directions of the currents flowing through the coils 11 and 12 are reverse to each other. Thereby, cusped fields 17 passing through a neutral plane 17a between these coils are generated from the center of each coil. The ingot is pulled at a speed so that the inside of the ingot becomes a perfect zone. The position of the neutral plane 17a of the cusped fields 17, the intensity of the cusped fields 17, the speed of the rotation of the quartz crucible 14 and the speed of the rotation of the ingot 16 are controlled so that the shape of the solid-liquid interface 19 between the silicon melt 13 and the ingot 16 becomes convex upward.
申请公布号 JP2003002784(A) 申请公布日期 2003.01.08
申请号 JP20010192162 申请日期 2001.06.26
申请人 SUMITOMO MITSUBISHI SILICON CORP 发明人 FU SHINRIN;SUZUKI YOJI;HARADA KAZUHIRO;FURUYA HISASHI;HIGUCHI AKIRA
分类号 C30B29/06;(IPC1-7):C30B29/06 主分类号 C30B29/06
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