| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum deposition polymerization system by which the sticking of dust blown up within a chamber to one side of the object to be deposited is prevented, and an organic film of high quality can be deposited on one side of the object to be deposited, and a method for depositing an organic film using the same system. SOLUTION: The vacuum deposition polymerization system is provided with a chamber B capable of exhausting the air at the inside to the outside, and making a vacuum state, gas generators 14a and 14b capable of gassifying monomers, gas introduction tubes 15a and 15b introducing the monomer gas gassified at the gas generators 14a and 14b into the chamber B, and a substrate 11 as the object to be deposited on which an organic film is vapor-deposited by the diffusion of the monomer gas within the chamber B. In the chamber B, in a state where the substrate 11 is tilted at a prescribed tilt angle C, and one side 11a of the substrate 11 is made downward, the organic film is vapor- deposited on the substrate 11.
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