发明名称 |
METHOD FOR MANUFACTURING SILICON |
摘要 |
PROBLEM TO BE SOLVED: To provide an industrial method for manufacturing silicon smoothly by preventing the blocking of a nozzle part of a reaction apparatus with silicon which is formed by reaction of chlorosilanes with hydrogen. SOLUTION: In the method for reacting chlorosilanes with hydrogen for formation of silicon, a reaction reagent capable of reacting with the formed silicon is successively or intermittently introduced into the reaction system.
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申请公布号 |
JP2003002627(A) |
申请公布日期 |
2003.01.08 |
申请号 |
JP20010187650 |
申请日期 |
2001.06.21 |
申请人 |
TOKUYAMA CORP |
发明人 |
NAKAJIMA JUNICHIRO;WAKAMATSU SATOSHI |
分类号 |
C01B33/03;(IPC1-7):C01B33/03 |
主分类号 |
C01B33/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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