| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type radiation sensitive composition used in the production of semiconductor circuits and lithography masks, having high resolution and high sensitivity and ensuring low edge roughness. SOLUTION: The positive type radiation sensitive composition contains an alkali-insoluble compound capable of forming an amorphous thin film by casting from a solution and having a structure in which at least two low molecular compounds combine to each other by way of an acid decomposable group. The alkali-insoluble compound is made alkali-soluble by the action of an acid. |
