APPARATUS AND METHOD FOR CLEANING HIGH DENSITY PCVD CHAMBER

摘要

PURPOSE: An apparatus and a method for cleaning a high density PCVD(Plasma Chemical Vapor Deposition) chamber are provided to prevent contamination and damages of a wafer by injecting uniformly cleaning gases into the inside of a chamber. CONSTITUTION: A PCVD chamber includes the first chamber(30a) and the second chamber(30b). A dome-shaped upper electrode(12) is installed at each upper portion of the first chamber(30a) and the second chamber(30b). The RF(Radio Frequency) power is applied to the upper electrode(12). A chuck assembly(16) is installed at each lower portion of the first chamber(30a) and the second chamber(30b). A lower electrode(14) is formed on an upper portion of the chuck assembly(16). The RF power is applied to the lower electrode(14). A plurality of process gas nozzles(18) are formed on sidewalls of the first chamber(30a) and the second chamber(30b). A plurality of cleaning gas nozzles(32a,32b) are formed at each lower portion of the process gas nozzles(18).