METHOD FOR MANUFACTURING PHASE SHIFT MASK

摘要

PURPOSE: A fabrication method of a phase shift mask is provided to prevent a failure of patterns and a scattering of light in a light shifting transmission region by forming a chrome spacer at inner walls of the light shifting transmission region. CONSTITUTION: After forming a chrome film on a quartz substrate(10), a chrome pattern(12') is formed by selectively etching the chrome film using the first resist pattern as a mask, thereby defining a light transmission region(A). The second resist pattern is formed on the chrome pattern(12'). A light shifting transmission region(B) is formed by etching the quartz substrate(10) using the second resist pattern as a mask. After removing the second resist pattern, chrome spacers are formed at inner walls of the light transmission and light shifting transmission region(A,B).