发明名称 NEW SQUARYLIUM COMPOUND AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a new squarylium bye derivative having a high thermal stability and vapor deposition characteristic, and its production method. SOLUTION: The new squarylium compound is represented by general formula (1). [In general formula (1), R1 and R2 are the same as or different from each other. If the same, each one shows an ethyl group, a n-propyl group or a branched 3-7C alkyl group. If different, each one independently shows an ethyl group, a n-propyl group, a n-butyl group, a n-pentyl group or a branched 3-7C alkyl group].
申请公布号 JP2003003082(A) 申请公布日期 2003.01.08
申请号 JP20010185041 申请日期 2001.06.19
申请人 FUJI XEROX CO LTD 发明人 DEN TAMINORI;FURUKI MAKOTO;IWASA IZUMI;SATO YASUSATO;FU RYUJUN;TATSUURA SATOSHI
分类号 G03G5/06;B41M5/26;C07C249/02;C07C251/20;C09B57/00 主分类号 G03G5/06
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