| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for manufacturing a mask which enable easy redesign of a mask used at manufacturing a substrate by division- exposure without causing the increase of a manufacturing cost. SOLUTION: By the mask manufacturing method, a pixel pattern with a prescribed arrangement is formed, the pixel pattern is divided by a zigzag parting line so as to form a plurality of divided areas, and a double exposure pattern to be doubly exposed is formed between a 1st division area and a 2nd division area adjacent to the 1st division area, and a light shielding pattern is arranged around the 1st division area, and then, by synthesizing the double exposure pattern and the light shielding pattern and overlaying the synthesized pattern on the pixel pattern, the mask pattern corresponding to the 1st division area is formed.</p> |
