发明名称 WATERLESS LITHOGRAPHIC PLATE
摘要 A method of producing a resist pattern on a substrate using a precursor which comprises a coating composition which includes a heat sensitive polymeric substance having functional groups Q thereon (wherein groups Q may be siloxane or optionally substituted fluoroalkyl groups) wherein groups Q cause the polymeric substance to have a reduced adhesive interaction with ink for use in waterless lithographic printing compared to aid polymeric substance in the absence of said groups, the method including the step of causing the patternwise application of heat to said coating composition and optional development thereby to define ink accepting areas in heat exposed areas and non-ink accepting areas in non-exposed areas.
申请公布号 EP1079973(B1) 申请公布日期 2003.01.08
申请号 EP19990913479 申请日期 1999.03.29
申请人 KODAK POLYCHROME GRAPHICS COMPANY LTD. 发明人 RAY, KEVIN BARRY;MCCULLOUGH, CHRISTOPHER DAVID
分类号 B41C1/055;B41C1/10;B41M5/36;C08G8/28;C08G8/32;G03F7/00 主分类号 B41C1/055
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