发明名称 |
ALKALI-SOLUBLE ACRYLIC RESIN COMPOSITION, PHOTOSENSITIVE TRANSPARENT INSULATING FILM-FORMING MATERIAL, METHOD FOR MANUFACTURING COLOR FILTER PROTECTION MEMBRANE, METHOD FOR MANUFACTURING REFLECTIVE BASE LAYER, COLORED IMAGE-FORMING MATERIAL, METHOD FOR MANUFACTURING COLOR FILTER AND COLOR FILTER |
摘要 |
PROBLEM TO BE SOLVED: To provide an alkali-soluble acrylic resin composition short in pattern- forming time and long in time from the beginning of pattern formation to the deformation of the shape of the pattern for alkali development, having improved adhesivity to a base material other than glass or an organic material, for example, an (oxidized) metal (ITO electrode, aluminum or the like) base material, a color filter using the composition and the like. SOLUTION: The alkali-soluble acrylic resin composition contains a polymer obtained by polymerizing a mixture consisting of 5-30 wt.% of a monomer having one N-substituted maleimide group, 5-30 wt.% of a monomer having a carboxyl group, 5-30 wt.% of a monomer having one hydroxyl group and 10-85 wt.% of a monomer having one benzene ring or cyclo ring. A method for manufacturing a color filter by using the composition is also provided. |
申请公布号 |
JP2003002924(A) |
申请公布日期 |
2003.01.08 |
申请号 |
JP20010184611 |
申请日期 |
2001.06.19 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
HARUHARA SEIJI;KOBAYASHI YUJI;KIMURA YOICHI;RYU JIYUNRIN;YAMAZAKI KOJI;OKAZAKI TETSUYA;YOKOCHI SEIGO |
分类号 |
G03F7/004;C08F2/44;C08F212/04;C08F220/06;C08F220/10;C08F222/40;C08F291/00;G02B5/20;G03B11/00;G03F7/033 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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