发明名称 HIGH RESOLUTION AND HIGH ADHESION PHOTOSENSITIVE RESIN COMPOSITION AND ITS USE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in resolution, adhesion, sensitivity, plating bath contaminating property, work efficiency, productivity and product stability and useful to increase the density of a printed circuit. SOLUTION: In the photosensitive resin composition containing (A) a polymer binder, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in one molecule, (C) a photopolymerization initiator and (D) an additive, the component (C) is an imidazole dimer and the component (D) carboxybenzotriazole and/or its derivative.
申请公布号 JP2003005359(A) 申请公布日期 2003.01.08
申请号 JP20010194377 申请日期 2001.06.27
申请人 HITACHI CHEM CO LTD 发明人 ITAGAKI KATSUTOSHI;OTOMO SATOSHI;FUKAYA TAKEHIRO;ABE TAKUJI;KAJIWARA TAKUYA
分类号 G03F7/004;C08F2/44;C08F2/50;C08F257/02;G03F7/027;G03F7/029;G03F7/031;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/004
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