发明名称 MANUFACTURING METHOD FOR THERMAL INFRARED DETECTOR
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a thermal infrared detector having beams of which lengths are optimum for minimizing temperature resolution according to the size of pixels. SOLUTION: On a substrate 1 with a read-out circuit, a pixel which has a diaphragm 2 including a bolometer thin film and two beams 3 for support of the diaphragm 2 with a space out of the substrate 1 is arranged. Each beam has a wiring 6 for connecting the bolometer film to the read-out circuit. The length of each beam is determined by the beam length index obtained by dividing the length of each beam by one fourth of the circumference of the pixel. The beam length index is determined by an approximate expression including the pixel pitch as a parameter obtained from the equation of temperature resolution in response to the type of the stepper used for pixel patterning and the thermal conductivity of the material of the wiring 6.
申请公布号 JP2003004525(A) 申请公布日期 2003.01.08
申请号 JP20020123830 申请日期 2002.04.25
申请人 NEC CORP 发明人 ODA NAOKI
分类号 G01J1/02;G01J5/02;G01J5/20;H01L27/14;H01L37/00;H01L37/02;(IPC1-7):G01J1/02 主分类号 G01J1/02
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