| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type chemical amplification system photosensitive resin composition having high sensitivity, high resolution, a good pattern shape and excellent process stability and to provide a method for producing a resist image. SOLUTION: In the positive type chemical amplification system photosensitive resin composition containing (a) a compound having an acid decomposable group in its molecule and having solubility in an aqueous alkali solution increased by an acid catalyzed reaction and a molecular weight lowered by the acid catalyzed reaction, (b) a compound which generates an acid when irradiated with active actinic radiation and (c) an acid diffusion inhibitor, the compound (b) is an onium salt and the counter anion of the onium salt is a hexafluoroantimonate. |
