| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrooptic device which can display an image of high quality by eliminating direction dependency of a scattering characteristic when reflected light is scattered by unevenness formed by using photolithography technology, and electronic equipment using the electrooptic device. SOLUTION: When a TFT array substrate of a reflection type or translucence and half-reflection type electrooptic device is manufactured, an evenness formation layer 14a having holes 13b (unevenness) is formed by exposing and developing photosensitive resin and then an intermediate film and a light-reflecting film for making the uneven shape smooth are formed. At this time, the holes 13b of the unevenness forming layer 13 are patterned in a polygonal plane shape whose sides 13b' are directed at random. |
