发明名称 PLASMA CVD SYSTEM
摘要 PROBLEM TO BE SOLVED: To elongate the service lives of seal members as consumables, to reduce the frequency of maintenance, and to reduce cost. SOLUTION: On cleaning treatment, inert gas having a prescribed pressure higher than that in a film deposition chamber 3 is forcedly fed to an annular groove 32 in the region of a ceiling board 4 and an annular groove 55 in the region of a carrying-in and out port 51, and the side of the film deposition chamber 3 and the sides of O-rings 31 and 53 are cut off, and the arrival of fluorine ions therein is checked to prevent their exposure to fluorine ions and to suppress deterioration in the O-rings 31 and 53. In this way, the service lives of the expensive O-rings 31 and 53 as consumables are remarkably elongated, the frequency of maintenance is reduced, and cost is remarkably reduced.
申请公布号 JP2003003263(A) 申请公布日期 2003.01.08
申请号 JP20010185840 申请日期 2001.06.20
申请人 MITSUBISHI HEAVY IND LTD 发明人 SHIMAZU TADASHI
分类号 C23C16/44;H01L21/205;(IPC1-7):C23C16/44 主分类号 C23C16/44
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