发明名称 LOW REFLECTIVE SUBSTRATE AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a low reflective substrate with excellent heat insulating property and low radiowave reflecting property and having high visible light transmittancy while having low visible light transmittancy on a film surface side, which does not become cloudy even when it is subjected to bending and/or reinforcing treatment, by heating the low reflective substrate coated with an antireflective film. SOLUTION: The antireflective film formed by laminating in order a titania film having a film thickness of from 15 to 60 nm as a first layer, a chromium nitride film having a film thickness of from 1 to 9 nm as a second layer and a transparent protecting film having a film thickness of from 20 to 100 nm and refractive index of from 1.3 to 2.2 as a third layer is coated on the surface of a transparent substrate.
申请公布号 JP2003002691(A) 申请公布日期 2003.01.08
申请号 JP20010184334 申请日期 2001.06.19
申请人 CENTRAL GLASS CO LTD 发明人 ONISHI MASAJI
分类号 G02F1/1335;C03C17/34;G02B1/11;G09F9/00;G09F9/30 主分类号 G02F1/1335
代理机构 代理人
主权项
地址