| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide film forming equipment that prevents generation of a transcription mark on substrates. SOLUTION: A photo-resist coating/vacuum drying unit (CT/VD) 22 which is one of the performing modes of the film forming equipment is equipped with a holding plate 40a which is able to suck and hold a substrate G in a roughly horizontal state, a rotary device 41 which rotates the holding plate 40a, a depression and suction device 66 which makes the holding plate 40a to suck and hold the substrate G, and a photo-resist solution discharge nozzle 73a to supply a photo-resist solution to the substrate G which is held by the holding plate 40a. On the surface of the holding plate 40a, annular suction grooves 81a to 81f are formed concentrically, and linear suction grooves 84 which communicate with the annular suction grooves 81a to 81f are formed non-radially. These measures help prevent radial transcription marks from occurring on the substrate G.</p> |
