发明名称 |
Method for fabricating mask |
摘要 |
A method for fabricating a mask comprising the steps of: (a) forming a light-shielding film on an entire surface of a substrate including an actual pattern region and an unoccupied region other than the actual pattern region; (b) patterning the light-shielding film on the actual pattern region while leaving the light-shielding film on the unoccupied region; and (c) removing the light-shielding film on the unoccupied region while leaving the patterned light-shielding film on the actual pattern region. |
申请公布号 |
US6503667(B1) |
申请公布日期 |
2003.01.07 |
申请号 |
US20000697424 |
申请日期 |
2000.10.27 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
KOBAYASHI SHINJI |
分类号 |
G03F1/08;G03F1/14;G03F1/36;G03F1/54;G03F1/60;G03F1/68;G03F1/80;G03F7/00;H01L21/027;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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