发明名称 WASHING BRUSH, AND UNIT AND METHOD TO USE THE BRUSH
摘要 PROBLEM TO BE SOLVED: To improve the production yield of liquid crystal boards and semiconductor boards by reducing foreign matters and scratches generated by brush washing to decrease device defects such as breakages and short circuits of wiring. SOLUTION: Bristle points of a brush are treated by a solvent or heating. Thus foreign matters and scratches generated on a board by brush washing can be reduced.
申请公布号 JP2003000349(A) 申请公布日期 2003.01.07
申请号 JP20010190589 申请日期 2001.06.25
申请人 HITACHI LTD 发明人 OSAWA TOSHIYUKI;TAKAHARA YOICHI
分类号 B08B1/04;A46D1/00;A46D1/05;B08B3/02;H01L21/304;(IPC1-7):A46D1/05 主分类号 B08B1/04
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