发明名称 Lateral bipolar transistor and method for producing the same
摘要 A lateral bipolar transistor includes: a substrate; a first insulative region formed on the substrate; a first semiconductor region of a first conductivity type selectively formed on the first insulative region; a second insulative region formed so as to substantially cover the first semiconductor region; and a second semiconductor region of a second conductivity type different from the first conductivity type, a second semiconductor region being selectively formed, wherein: the second insulative region has a first opening which reaches a surface of the first semiconductor region, and the first semiconductor region has a second opening which reaches the underlying first insulative region, the second opening being provided in a position corresponding to the first opening of the second insulative region; the second semiconductor region is formed so as to fill the first opening and the second opening, thereby functioning as a bass region; a lower portion of the second semiconductor region which at least fills the second opening is formed by lateral growth from a face of the first semiconductor region defining a side wall of the second opening; and the first semiconductor region includes an emitter region and a collector region formed therein.
申请公布号 US6503808(B1) 申请公布日期 2003.01.07
申请号 US20000687251 申请日期 2000.10.13
申请人 MATSUSHITA ELECTRONICS CORPORATION 发明人 MATSUNO TOSHINOBU;FUKUDA TAKESHI;NISHII KATSUNORI;INOUE KAORU;UEDA DAISUKE
分类号 H01L21/331;H01L29/165;H01L29/73;(IPC1-7):H01L21/331 主分类号 H01L21/331
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