Contact structure for a semiconductor device and manufacturing method thereof

摘要

A semiconductor contact structure for a merged dynamic random access memory and a logic circuit (MDL) and a method of manufacturing the contact structure to: (i) a cell contact pad; (ii) at least one active region; and (iii) at least one gate electrode simulaneously, whereby an electric short between the gate electrodes and the cell contact pad is avoided, even in the event a lithographic misalignment occurs and whereby it is possible to obtain an overlap margin in the cell region, even with an improved metal contact to the gate electrode in the peripheral circuit region of the semiconductor device.