发明名称 Fabrication process for a semiconductor device with an isolated zone
摘要 The semiconductor device comprises a semiconductor substrate (SB) having locally at least one zone (ZL) terminating in the surface of the substrate and entirely bordered, along its lateral edges and its bottom, by an insulating material so as to be completely isolated from the rest of the substrate. The horizontal isolating layer may be a layer of constant thickness or a crenellated layer.
申请公布号 US6503812(B2) 申请公布日期 2003.01.07
申请号 US20020044829 申请日期 2002.01.11
申请人 STMICROELECTRONICS S. A. 发明人 MENUT OLIVIER;BOUCHE GUILLAUME;JAOUEN HERVE
分类号 H01L21/762;(IPC1-7):H01L21/76 主分类号 H01L21/762
代理机构 代理人
主权项
地址