| 摘要 |
PURPOSE: An amorphous silicon solar cell having a fine crystalline silicon layer containing chlorine and a method for manufacturing the same are provided to be capable of increasing band gap and electric conductivity and improving fill factor. CONSTITUTION: An amorphous silicon solar cell is provided with at least one p-i-n structure. At this time, the n-type layer(14,14') are formed by carrying out a PECVD(Plasma Enhanced Chemical Vapor Deposition) using mixed gas as a chemical source. The mixed gas is made of SiH4 gas and at least one selected from a group consisting of SiHCl3, SiH2Cl3, SiH2Cl2, SiH3Cl, and SiCl4 gas. Preferably, the flow rate of the SiH4 gas is in the range of 0.5-2 corresponding to the gas selected from the group consisting of SiHCl3, SiH2Cl3, SiH2Cl2, SiH3Cl, and SiCl4 gas.
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