| 摘要 |
PROBLEM TO BE SOLVED: To provide equipment for the treatment of waste water containing gallium which treats waste water containing gallium discharged from the polishing process or the like in manufacturing factories of compound semiconductor wafers, manufacturing factories of devices or the like or waste water containing gallium in which waste water from a polishing process is mixed in a reservoir and with which gallium being a rate and valuable metal can be completely and efficiently collected as hydroxides in a highly concentrated state. SOLUTION: The equipment for the treatment of waste water containing gallium is equipped with a pretreatment means where the waste water containing gallium and suspended substance is introduced to remove the suspended substances, a hydroxide producing means to convert the gallium in the waste water containing gallium from which the suspended substances are removed into hydroxides, and a solid liquid separating means where the water containing hydroxides from the hydroxide producing means is introduced and separated into the hydroxides and treated water.
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