发明名称 |
EQUIPMENT FOR TREATMENT OF WASTE WATER CONTAINING GALLIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide equipment for the treatment of waste water containing gallium which treats waste water containing gallium discharged from manufacturing factories of compound semiconductor wafers, manufacturing factories of devices or the like and with which gallium being a rare and valuable metal can be efficiently collected. SOLUTION: The equipment for the treatment of waste water containing gallium is equipment with a gallium adsorbing means where the water containing gallium ion to be treated is introduced and with a concentrating means to concentrate the desorbed liquid from the gallium adsorbing means.
|
申请公布号 |
JP2003001246(A) |
申请公布日期 |
2003.01.07 |
申请号 |
JP20010185368 |
申请日期 |
2001.06.19 |
申请人 |
KURITA WATER IND LTD |
发明人 |
MATSUMOTO AKIRA;HAYASHI KAZUKI |
分类号 |
B01D61/02;B01D61/14;C01G15/00;C02F1/04;C02F1/28;C02F1/44;(IPC1-7):C02F1/28 |
主分类号 |
B01D61/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|