发明名称 IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to improve a photo sensitivity by using a lens frame for preventing contact between microlens. CONSTITUTION: A substrate having color filters is prepared. After forming an OCL(Over Coating Layer)(8) on the substrate, a transparent insulating layer(9) is deposited on the OCL(8). A lens frame(11) is formed at edge portions of transparent insulating patterns by selectively etching the transparent insulating layer(9). A resist pattern is coated on the lens frame(11). By flowing the resist pattern, a microlens(12) is formed between the lens frames(11).
申请公布号 KR20030001077(A) 申请公布日期 2003.01.06
申请号 KR20010037407 申请日期 2001.06.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LIM, BU TAEK
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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