METHOD FOR MANUFACTURING PHASE SHIFT MASK

摘要

PURPOSE: A method for manufacturing a phase shift mask is provided to improve the uniformity of phase shifting and to prevent a micro-loading effect by forming an etch stopper between a transparent substrate and a phase shifting layer. CONSTITUTION: An etch stopper(22) is formed on a transparent substrate(20). A phase shifting layer is formed on the etch stopper(22). At this time, the etch stopper(22) has a high etching selectively compared to the phase shifting layer. A light shielding layer is formed on the phase shifting layer. By sequentially etching the light shielding layer and the phase shifting layer using the etch stopper(22), a phase shifting pattern(24) and a light shielding pattern(26) are formed.