PHOTOSENSITIVE POLYMER CONTAINING FLUORINE-SUBSTITUTED CYCLIC MONOMER AND RESIST COMPOSITION CONTAINING THE POLYMER

摘要

PURPOSE: A photosensitive polymer containing a fluorine-substituted cyclic monomer and a resist composition containing the composition are provided, which is transparent to the light less than 193 nm and shows a good adhesive property to a membrane, a large dry etching resistance and a good contrast characteristic. CONSTITUTION: The photosensitive polymer contains a fluorine-substituted cyclic monomer represented by the formula, wherein at least one between X and Z is a fluorocarbon of C1-C3; and Y is a fluorocarbon of C1-C3, O, S, NH, NCH3, Si(CH3)2, Si(C2H5)2, carbonyl, or ester group. The resist composition comprises the photosensitive polymer; 1-15 wt% of a photoacid generator; and optionally 0.01-2.0 wt% of an organic base. Preferably the photoacid generator is selected from the group consisting of a triarylsulfonium salt, a diarylodonium salt, a sulfonate and their mixtures; and the organic base is selected from the group consisting of triethylamine, triisobutylamine, triisooctylamine, triisodecylamine, diethanolamine and their mixtures.