| 摘要 |
PURPOSE: To provide a method and apparatus for cleaning s single wafer, capable of effectively preventing wraparound of chemicals to a rear surface of the wafer, when cleaning a surface of the wafer with chemicals. CONSTITUTION: When wet-cleaning a surface Wa of a rotatably supported single wafer W, by sequentially delivering a plurality of chemicals from above, jet- delivering purified water to a rear side Wb of the wafer W effectively prevent wraparound of chemicals to the rear side Wb, as well as cleans the rear side Wb. |
