GAS JET DEPOSITION APPARATUS

摘要

A gas jet deposition method and apparatus includes a plurality of ports (132) to supply plasma to the substrate on which deposition is to occur. A reagent gas is introduced either into the ports or into the expansion chamber (120). The use of multiple ports results in a much more uniform deposition of material on the substrate. In preferred embodiments, a carrier gas plasma is created using an excitation source such as a microwave power supply.