发明名称 |
Cleaning solution for removing residue |
摘要 |
A solution for washing away residue, comprising an aqueous solution of a water-soluble high molecular compound in which is dissolved at least one kind of dissolving agent selected from an amine and a fluoride. The washing solution is capable of effectively washing away the residue formed during the production of electronic circuits, is very lowly corrosive to the insulating films, low-dielectric interlayer insulating films and wirings, and offers an advantage of little generating foam.
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申请公布号 |
US2003004075(A1) |
申请公布日期 |
2003.01.02 |
申请号 |
US20020111457 |
申请日期 |
2002.04.25 |
申请人 |
SUTO MIZUKI;MIKAMI ICHIRO;NONAKA TOHRU;TONO SEIJI |
发明人 |
SUTO MIZUKI;MIKAMI ICHIRO;NONAKA TOHRU;TONO SEIJI |
分类号 |
C11D3/37;C11D7/10;C11D7/26;C11D7/32;C11D7/34;C11D7/50;C11D11/00;G03F7/42;(IPC1-7):C11D17/00 |
主分类号 |
C11D3/37 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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