发明名称 Electrodeposition coating film thickness calculating method and electrodeposition coating film thickness simulation apparatus
摘要 <p>A finite element model of the environment of electrodeposit coating is prepared by a simulation method, change of an electric field in an electrolytic cell (7) for the case of electrodeposit coating is simulated, the distribution of currents then flowing through individual parts of a finite element model of a to-be-coated object (10) is obtained, the electric variables of currents flowing through the respective surfaces of the finite elements of the to-be-coated object are obtained and accumulated according to the current distribution, the thickness of an electrodeposition coating film is calculated as h = SIGMA KFICC.E. DELTA t/ rho if the cumulative electric variable is higher than a deposition starting electric variable such that a fixed concentration is attained by OH- or H<+>. <IMAGE> <IMAGE> <IMAGE></p>
申请公布号 EP1270766(A2) 申请公布日期 2003.01.02
申请号 EP20020009129 申请日期 2002.04.24
申请人 C. UYEMURA & CO, LTD 发明人 KATSUMARU, SHINJI;YAGESAWA, KIYOTAKA;WADA, TAKASHI;OHARA, KATSUHIKO
分类号 C25D13/14;C25D13/22;C25D21/12;G01B21/08;(IPC1-7):C25D13/22 主分类号 C25D13/14
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