发明名称 |
Method and installation for fabricating one-sided buried straps |
摘要 |
Buried straps are produced on one side in deep trench structures. A PVD process is used to deposit masking material in the recess inclined at an angle. As a result, a masking wedge is produced on the buried strap, on one side in the base region of the recess. The masking wedge serves as a mask during a subsequent anisotropic etching step, which is carried out selectively with respect to the masking wedge, for removing the buried strap on one side.
|
申请公布号 |
US2003003652(A1) |
申请公布日期 |
2003.01.02 |
申请号 |
US20020186656 |
申请日期 |
2002.07.01 |
申请人 |
GOBEL BERND;GUTSCHE MARTIN;KERSCH ALFRED;STEINHOGL WERNER |
发明人 |
GOBEL BERND;GUTSCHE MARTIN;KERSCH ALFRED;STEINHOGL WERNER |
分类号 |
H01L21/3213;H01L21/8242;(IPC1-7):H01L21/824;H01L21/20 |
主分类号 |
H01L21/3213 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|