摘要 |
The invention relates to a device for flat illumination of an object field in an optical apparatus and to an optical apparatus having said device, said optical apparatus being, for example, microscopes, including microlithography simulation microscopes, wherein a flat illumination, i.e. extending over a singular object point, of the object to be examined is required. The device comprises a laser light source (8) and a fiber optic cable (9) having at least one optic fiber through which the light is guided from the laser light source (8) to the object field. The optic fiber is configured and designed in such a way that the intensity of the illumination light is increasingly homogenized in the cross section of the optical fiber during its course from the end on the incidence side to the end on the radiation side and the illumination light from the end on the radiation side of optical fiber is directed to the object (O) with substantially homogenous intensity distribution.
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