不连续掺杂区域之半导体薄片之制造方法,申请号TW018949-传众专利搜索

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发明名称	不连续掺杂区域之半导体薄片之制造方法
摘要
申请公布号	TW010415	申请公布日期	1972.02.01
申请号	TW018949	申请日期	1971.07.24
申请人	西方电器公司	发明人	RONALD LEE MEEK
分类号	H01L	主分类号	H01L
代理机构		代理人	林敏生台北巿南京东路二段一二五号七楼伟成第一大楼
主权项
地址	美国纽约州纽约巿洛克飞楼广场30号

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