发明名称 Electrostatic discharge protection in double diffused MOS transistors
摘要 The specification describes a DMOS transistor that is fully integrated with an electrostatic protection diode (ESD). The ESD diode is isolated from the DMOS device by a trench. The trench is metallized to tie the guard ring of the ESD to the substrate thereby increasing the current handling capabilities of the ESD. The trench also provides a convenient buried contact to the RF ground.
申请公布号 US2003001199(A1) 申请公布日期 2003.01.02
申请号 US20010896669 申请日期 2001.06.29
申请人 SHIBIB MUHAMMED AYMAN 发明人 SHIBIB MUHAMMED AYMAN
分类号 H01L21/336;H01L21/8234;H01L27/02;H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119;(IPC1-7):H01L29/76 主分类号 H01L21/336
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