发明名称 Aligning method, exposure method, exposure apparatus, and device manufacturing method
摘要 According to an aligning method, positions of measurement marks at a plurality of shot positions on a substrate are measured, measurement values are statistically processed, and a master and the substrate are aligned. When a plurality of measurement marks exist in a shot, measurement marks to be used for alignment are selected from them independently of each other. An alignment measurement sample shot which is not adversely affected by a shot size is selected, so an alignment precision is improved.
申请公布号 US2003003384(A1) 申请公布日期 2003.01.02
申请号 US20020178234 申请日期 2002.06.25
申请人 CANON KABUSHIKI KAISHA 发明人 HOSHI TAI
分类号 G01B11/00;G03F7/22;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):G03B27/00;G03C5/00 主分类号 G01B11/00
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