Method for fabricating an organic thin film

摘要

First, an undercoating film (11) made of silicon nitride or silicon nitride oxide is formed on a substrate (10). Then the undercoating film is subjected to both/either process A of wet-cleaning (12) the undercoating film with a cleaning liquid and/or process B of irradiating ultraviolet light (13) onto the undercoating film. Afterward, an organic thin film (14) is formed on the undercoating film by providing a liquid organic material (a specific organic material is used if only either process A or process B has been performed). <IMAGE>