| 发明名称 |
Apparatus and method for electro chemical deposition |
| 摘要 |
A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.
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| 申请公布号 |
US2003000841(A1) |
申请公布日期 |
2003.01.02 |
| 申请号 |
US20020217872 |
申请日期 |
2002.08.13 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
STEVENS JOSEPH J.;RABINOVICH YEVGENIY;CHAO SANDY S.;DENOME MARK R.;D'AMBRA ALLEN L.;OLGADO DONALD J. |
| 分类号 |
C25D17/00;C25D7/12;C25D21/14;C25D21/18;H01L21/288;(IPC1-7):C25D21/12;B23H3/02;B23H7/04;B23H7/14;C25B9/00;C25B9/04;C25B15/00;C25C3/16;C25C3/20;C25D3/38;C25D5/00;C25D5/02;C25F7/00;H01L21/445 |
主分类号 |
C25D17/00 |
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