发明名称 Resistance value adjusting method
摘要 A resistance value adjusting method for adjusting a resistance value of a film resistor which has a plurality of linear conductive films (1) formed in parallel on a substrate, and a resistive film (2) formed over portions of the plurality of linear conductive films in a width direction of the linear conductive films, wherein an electric contact is slid over the plurality of linear conductive films 1 to change a detected resistance value. A single resistive element is defined as a resistive film which is formed over a first linear conductive film (1A) formed at a management point at which a first resistance value is detected when the electric contact is slid thereto and a second linear conductive film (1B) formed through the first linear conductive film (1A) and a plurality of linear conductive films at a management point at which a second resistance value is detected when the electric contact is slid thereto, and the resistive element is trimmed in the width direction of the linear conductive films when the resistance value is adjusted.
申请公布号 US2003000071(A1) 申请公布日期 2003.01.02
申请号 US20020180061 申请日期 2002.06.27
申请人 YAZAKI CORPORATION 发明人 NAGAKURA SYUNSUKE;OOISHI MANABU;MARUO HISAFUMI
分类号 H01C17/22;G01F23/36;H01C10/44;H01C17/235;(IPC1-7):H01C17/00 主分类号 H01C17/22
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