发明名称 |
Machine for adjusting position of wafer with respect to irradiation mask comprises platforms mounted on columns, at least two bearings being mounted in walls of apertures in platforms fitting around columns |
摘要 |
The machine for adjusting the position of a wafer with respect to an irradiation mask comprises platforms (14, 16) mounted on columns (22). At least two bearings are mounted in the walls of apertures in the platforms which fit around the columns.
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申请公布号 |
DE10128712(A1) |
申请公布日期 |
2003.01.02 |
申请号 |
DE20011028712 |
申请日期 |
2001.06.13 |
申请人 |
THALLNER, ERICH |
发明人 |
THALLNER, ERICH |
分类号 |
B65G49/07;G03F7/20;H01L21/68;(IPC1-7):B65G49/07 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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