发明名称 |
Laser illumination system |
摘要 |
The illumination energy of an excimer laser is measured and adjusted to always effect illumination at constant energy. A laser beam output from an optics is reflected by a mirror, and applied to a sample. A beam profiler is disposed behind the mirror to measure the energy of an illumination laser beam. An energy attenuating device disposed between another mirror and the optics is operated based on the measurement value so that the energy of the laser beam applied to the sample is kept constant.
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申请公布号 |
US2003003610(A1) |
申请公布日期 |
2003.01.02 |
申请号 |
US20020178349 |
申请日期 |
2002.06.25 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI;TANAKA KOICHIRO |
分类号 |
B23K26/073;B23K26/42;(IPC1-7):H01L21/66 |
主分类号 |
B23K26/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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