| 发明名称 |
METHOD FOR TREATING A SUBSTRATE WITH PHOTOCATALYTIC PARTICLES SO AS TO MAKE SAID SUBSTRATE SELF-CLEANING |
| 摘要 |
The invention concerns a method for treating substrates comprising the following steps which consist in: 1) treating the substrates with a dispersion of photocatalytic particles; 2) treating the substrate with at least a siliconized compound selected among the siliconates and the polyorganosiloxanes. |
| 申请公布号 |
EP1153001(B1) |
申请公布日期 |
2003.01.02 |
| 申请号 |
EP20000901176 |
申请日期 |
2000.01.25 |
| 申请人 |
RHODIA CHIMIE |
发明人 |
CHAUFFRIAT, HENRI;ROCHER, LAURENT |
| 分类号 |
B01J35/00;B05D5/08;B05D7/00;B08B17/00;C03C17/42;C04B41/50;C04B41/52;C09D5/16;C09D183/06;C09D183/16 |
主分类号 |
B01J35/00 |
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