摘要 |
<p>Device of parent patent is modified by provision of an auxiliary venturi downstream of the main venturi on the path of the gas stream to be treated, and the atomiser for auxiliary material (e.g. water) is positioned coaxially in the auxiliary venturi. The particles in the gas stream, ionised by electrode coaxial with main venturi, encounter the spray of water with considerable relative velocity, increasing scrubbing efficiency. Add. to 13.2.69, 003675.</p> |