发明名称 Compound semiconductor device
摘要 There is provided a compound semiconductor device having a MESFET whic comprises a channel layer made of InxGa1-xPySb1-y (where 0.3<x<0.7, 0.9<y<0.999999) formed by doping an impurity onto a substrate, a barrier layer formed on the channel layer, a gate layer formed on the barrier layer, and a source electrode and a drain electrode formed separately on both sides of the gate electrode on the barrier layer. Accordingly, the mutual conductance of the compound semiconductor device having the MESFET can be increased rather than the prior art.
申请公布号 US6501105(B2) 申请公布日期 2002.12.31
申请号 US20010818646 申请日期 2001.03.28
申请人 FUJITSU LIMITED 发明人 KIKKAWA TOSHIHIDE
分类号 H01L21/338;H01L29/10;H01L29/201;H01L29/812;(IPC1-7):H01L31/032 主分类号 H01L21/338
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