发明名称 High-voltage transistor with buried conduction layer
摘要 A lateral, high-voltage, FET having a low on-resistance and a buried conduction layer comprises a P-type buried layer region within an N-well formed in a P-type substrate. The P-type buried layer region is connected to a drain electrode by a first P-type drain diffusion region that is disposed in the N-well region. The P-type buried layer region is also connected to a second P-type drain diffusion region that extends down from the surface at one end of the PMOS gate region. A P-type source diffusion region, which connects to the source electrode, defines the other end of the gate region.
申请公布号 US6501130(B2) 申请公布日期 2002.12.31
申请号 US20020176345 申请日期 2002.06.20
申请人 POWER INTEGRATIONS, INC. 发明人 DISNEY DONALD RAY
分类号 H01L21/336;H01L21/337;H01L21/8234;H01L21/8238;H01L27/092;H01L29/06;H01L29/08;H01L29/40;H01L29/417;H01L29/78;H01L29/808;(IPC1-7):H01L31/062 主分类号 H01L21/336
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