发明名称 METHOD FOR MANUFACTURING MICRO DEVICE THROUGH MONOLITHIC PROCESS
摘要 PURPOSE: A method for manufacturing micro device is provided, in which alignment and bonding processes are eliminated, to thereby reduce power consumption and manufacturing cost. CONSTITUTION: A method for manufacturing micro device, comprises a first step of forming a channel layer onto a substrate; a second step of sequentially forming a cover layer(12) and an energy supply unit(18) onto the channel layer; a third step of forming a fluid inlet port and a fluid outlet port(17) by selectively removing the cover layer or the lower portion of the substrate in such a manner that the channel layer is partially exposed; and a fourth step of forming a fluid flow portion by selectively removing the channel layer through the fluid inlet port or the fluid outlet port. The substrate is formed into multiple layers including a silicon layer, oxide layer or a nitride layer.
申请公布号 KR20020096298(A) 申请公布日期 2002.12.31
申请号 KR20010034688 申请日期 2001.06.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SEO, O GWON
分类号 F04B43/04;(IPC1-7):F04B43/04 主分类号 F04B43/04
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