发明名称 |
Method for manufacturing TFT-integrated color filter using photocatalysis, color filter, and liquid crystal display |
摘要 |
A method for manufacturing a TFT-integrated color filter is provided, which can controllably fabricate a color filter having a high aperture efficiency and a high resolution at low costs without the need for aligning the color filter with a TFT substrate as required by the prior art. The method for manufacturing a thin-film transistor integrated color filter includes the steps of: preparing a color filter fabrication substrate by forming thin-film transistors and light-transmissive pixel electrodes in arrays on a light-transmissive substrate and providing a photocatalytic thin film in contact with the pixel electrodes so that portions of the pixel electrodes are exposed; preparing an electrolytic solution containing a coloring material and another material which may decrease in solubility or dispersibility with respect to an aqueous solution with any change in pH; placing the color filter fabrication substrate in the electrolytic solution so that at least the pixel electrodes and the photocatalytic thin film are in contact with the electrolytic solution; and with predetermined ones of the thin-film transistors driven selectively, illuminating the color filter fabrication substrate with ultraviolet light to form a colored film on the surface of the photocatalytic thin film corresponding to the undriven thin-film transistors.
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申请公布号 |
US6500589(B1) |
申请公布日期 |
2002.12.31 |
申请号 |
US20000656120 |
申请日期 |
2000.09.06 |
申请人 |
FUJI XEROX CO., LTD. |
发明人 |
OHTSU SHIGEMI;TOMONO TAKAO;SHIMIZU KEISHI;AKUTSU EIICHI |
分类号 |
G02B5/20;G02F1/1335;G02F1/136;G02F1/1362;G02F1/1368;(IPC1-7):G02B5/20;G02F1/133 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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