发明名称 Method and apparatus for an increased throughput furnace nitride BARC process
摘要 Embodiments of the invention comprise a new device and technique to realize an improved throughput of a BARC layer furnace deposition device. This improvement is achieved by providing for a higher flow rate of NH3 during the BARC deposition process. Also, this improvement may be achieved by reducing the temperature gradient of the BARC layer furnace deposition device to approximately 715-750° C. For example, approximately a 1-10% blend of NH3 in at least one of Argon, Nitrogen, and Helium is utilized. By diluting the NH3, a higher flow rate may be utilized in the furnace deposition device, thus allowing for an increased load uniformity of the BARC layer thickness, refractive index, extinction coefficient, and reflectivity characteristics. Also, the NH3 depletion is reduced and preferably eliminated due to the higher flow rate of the diluted NH3. Further, this diluted NH3 allows for a reduced DCS requirement, thus reducing maintenance requirements, exhaust component contamination and allowing for a lowering of the particulates. The diluted NH3 is preferably supplied at approximately 200-500 SCCM, and the DCS flow rate is reduced to approximately 100-150 SCCM, at a pressure of approximately 200-350 mTorr.
申请公布号 US6500774(B1) 申请公布日期 2002.12.31
申请号 US20000608003 申请日期 2000.06.30
申请人 ADVANCED MICRO DEVICES, INC. 发明人 BHAKTA JAYENDRA D.
分类号 C23C16/34;H01L21/027;H01L21/318;(IPC1-7):H01L21/31;H01L21/469;H01L21/476 主分类号 C23C16/34
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